ANTIREFLECTION FILM, OPTICAL ELEMENT AND METHOD FOR DEPOSITING ANTIREFLECTION FILM

To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a mult...

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Bibliographische Detailangaben
Hauptverfasser:	KAWAMATA KAZUO, HASHIMOTO RYO, SHIBUYA MINORU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide: an antireflection film having low reflectance, small unevenness of reflected color and excellent durability; an optical element including the same; and a film deposition method excellent in the productivity of such an antireflection film.SOLUTION: An antireflection film 1 includes a multilayer structure provided on the side of the convex optical surface 11a of an optical element 11 having a convex optical surface 11a having the maximum inclination angle of 25° or more. In each optical thin film 2 constituting the multilayer structure, a filling ratio at any point is 90% or more; a L value in a CIE1976 Labcolor system satisfies the following conditional expressions (1); a difference Δa between a values in any two points and a difference Δb between b values in the two points satisfy the following conditional expressions (2). L