REPRODUCING APPARATUS AND REPRODUCING METHOD FOR PLASMA PROCESSING APPARATUS

To provide a reproducing apparatus for a plasma processing apparatus capable of easily reproducing components of the plasma processing apparatus.SOLUTION: The reproducing apparatus for a plasma processing apparatus includes: an application unit; a solidifying unit, and a control unit. The applicatio...

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1. Verfasser:	MIZUNO HISAYUKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	To provide a reproducing apparatus for a plasma processing apparatus capable of easily reproducing components of the plasma processing apparatus.SOLUTION: The reproducing apparatus for a plasma processing apparatus includes: an application unit; a solidifying unit, and a control unit. The application unit applies a reproducing liquid to a consumable part of a component configuring the plasma processing apparatus. The solidifying unit solidifies the reproducing liquid applied to the component. The control unit controls application of the reproducing liquid to the consumable part of the component by the application unit.SELECTED DRAWING: Figure 4 【課題】プラズマ処理装置の構成部品を容易に再生することができるプラズマ処理装置の再生装置を提供する。【解決手段】実施形態によれば、プラズマ処理装置の再生装置は、塗布部と、固化部と、制御部と、を備える。前記塗布部は、プラズマ処理装置を構成する部品の消耗部に再生液を塗布する。前記固化部は、前記部品に塗布された前記再生液を固化させる。前記制御部は、前記部品の消耗部への前記塗布部による前記再生液の塗布を制御する。【選択図】図４