SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

To provide a technique by which treatment liquid can be excellently applied to a substrate which is applied with floating force and then carried.SOLUTION: A coating applicator 1 comprises: a floating stage part 3 that applies floating force to a substrate W; a carrying mechanism 5 that moves the substrate W applied with the floating force in a first direction D1; a nozzle 61 that discharges treatment liquid toward an upper surface Wf of the floated substrate; a measurement instrument 70 that measures a position in a vertical direction of the upper surface Wf of the substrate W; and a movement mechanism 63 that moves the nozzle 61 and the measurement instrument 70. The movement mechanism 63 moves the nozzle 61 and the measurement instrument 70 so that an adhesion horizontal position, a horizontal position at which treatment liquid from the nozzle 61 adheres to the substrate W comes close to a measurement horizontal position XM1, a horizontal position in an area where the measurement instrument 70 previously measures a vertical position of the substrate W.SELECTED DRAWING: Figure 8 【課題】浮上力が付与されて搬送される基板に処理液を良好に塗布する技術を提供する。【解決手段】塗布装置１は、基板Ｗに浮上力を付与する浮上ステージ部３と、浮上力が付与された基板Ｗを第１方向Ｄ１に移動させる搬送機構５と、浮上基板の上面Ｗｆに向けて処理液を吐出するノズル６１と、基板Ｗの上面Ｗｆの鉛直位置を測定する測定器７０と、ノズル６１および測定器７０を移動させる移動機構６３を備える。移動機構６３は、ノズル６１からの処理液が基板Ｗに付着する水平位置である付着水平位置が、測定器７０が基板Ｗの鉛直位置を予め測定する領域の水平位置である測定水平位置ＸＭ１に近づくように、６１ノズルおよび測定器７０を移動させる。【選択図】図８