MEASUREMENT METHOD, ADJUSTMENT METHOD, AND OPTICAL SYSTEM MANUFACTURING METHOD

To provide a high-quality optical system.SOLUTION: A measurement method includes the steps of: measuring a transmission wavefront of transmission light transmitting an inspected optical system; acquiring each aberration component of a wavefront aberration of the inspected optical system on the basis of the transmission wavefront of the transmission light; acquiring a changing sensitivity degree of each aberration component of the wavefront aberration when causing an optical element of the inspected optical system a position deviation; acquiring coefficient information for enhancing a correlation between each aberration component of the wavefront aberration and an evaluation value about an image-formation performance of the inspected optical system; and obtaining an amount of position deviation of the optical element of the inspected optical system, using each aberration component of the wavefront aberration, the sensitivity degree of each aberration component and the coefficient information.SELECTED DRAWING: Figure 2 【課題】 高画質な光学系を提供すること。【解決手段】 被検光学系を透過した透過光の透過波面を計測するステップと、前記透過光の透過波面に基づいて前記被検光学系の波面収差の各収差成分を取得するステップと、前記被検光学系の光学素子を位置ずれさせた際に変化する前記波面収差の各収差成分の敏感度を取得するステップと、前記被検光学系の結像性能に関する評価値と前記波面収差の各収差成分の相関を高めるための係数情報を取得するステップと、前記波面収差の各収差成分と前記各収差成分の敏感度と前記係数情報を用いて前記被検光学系の光学素子の位置ずれ量を求めるステップとを含むことを特徴とする計測方法。【選択図】 図２