VACUUM EVAPORATION DEVICE

To provide a vacuum evaporation device having a regulation plate which suppresses blocking of a scattering path toward an evaporation object of a sublimated or vaporized evaporation material as much as possible, even if the evaporation material is adhered and deposited.SOLUTION: A vacuum evaporation...

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Hauptverfasser: KITAZAWA RYOYA, UMEHARA SEIJI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a vacuum evaporation device having a regulation plate which suppresses blocking of a scattering path toward an evaporation object of a sublimated or vaporized evaporation material as much as possible, even if the evaporation material is adhered and deposited.SOLUTION: A vacuum evaporation device DM includes an evaporation source 4 in a vacuum chamber 1, sublimates or evaporates an evaporation material 5 by the evaporation source in a vacuum atmosphere, and deposits the sublimated or evaporated evaporation material on an evaporation object. The vacuum evaporation device further includes a regulation plate 7 which regulates a scattering range of the evaporation material scattering from the evaporation source to an evaporation material Sw by being cantilevered by a support body 6 provided in the vacuum chamber, wherein while one face directed to the evaporation source side of the regulation plate is defined as a bottom face 71 and the other face thereof is defined as a top face 72, an inclined plane 73 is formed crossing with the bottom face at an obtuse angle α1, and with a top face edge at an acute angle α2 at a free end of the regulation plate.SELECTED DRAWING: Figure 2 【課題】蒸着物質が付着、堆積しても、昇華または気化した蒸着物質の被蒸着物に向かう飛散経路を遮ることが可及的に抑制されるようにした規制板を有する真空蒸着装置を提供する。【解決手段】本発明の真空蒸着装置DMは、真空チャンバ1内に蒸着源4を備え、真空雰囲気中にてこの蒸着源で蒸着物質5を昇華または気化させ、この昇華または気化した蒸着物質を被蒸着物に蒸着する。真空チャンバ内に設けた支持体6で片持ち支持されて、蒸着源から被蒸着物Swに向けて飛散する蒸着物質の飛散範囲を規制する規制板7を更に備え、規制板のうち蒸着源側を向く一方の面を下面71、その他方を上面72として、規制板の自由端に、下面と鈍角α1で且つ上面端部と鋭角α2で交差する傾斜面73が形成されている。【選択図】図2