PLATING FACILITY

To provide a plating facility capable of simplifying a whole structure of the plating facility.SOLUTION: A plating facility is equipped with storage tanks (11, 12, 13) for storing liquid, a pump 14 for sending the liquid, and a pipe 15 composed of a suction side pipe 15a for connecting the storage t...

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Bibliographische Detailangaben
Hauptverfasser: OTA MASUYUKI, YAMAMOTO NAOTERU, TANIGAWA JUNICHIRO, NISHIBAYASHI SADAHIRO, FUJII NORIHIRO
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To provide a plating facility capable of simplifying a whole structure of the plating facility.SOLUTION: A plating facility is equipped with storage tanks (11, 12, 13) for storing liquid, a pump 14 for sending the liquid, and a pipe 15 composed of a suction side pipe 15a for connecting the storage tanks, the pump and a discharge side pipe 15b. The storage tanks (11, 12, 13) have each a liquid outlet (11a,12a,13a). The pump 14 is not a self-suction pump and has a suction port 14a. The suction side pipe 15a is installed so as to connect the liquid outlets of the storage tanks and the suction port of the pump. An elevation difference H is formed at the suction side pipe 15a so that the liquid flows down by gravity from the liquid outlets of the storage tanks to the suction port of the pump.SELECTED DRAWING: Figure 2 【課題】めっき設備全体の構成を簡素化することができるめっき設備を提供する。【解決手段】液体を貯留する貯留槽(11,12,13)と、液体を圧送するポンプ14と、貯留槽とポンプとを接続すべくポンプの取り込み側に配置された取り込み側配管15aとポンプの吐出側に配置された吐出側配管15bとを有する配管15と、を備えるめっき設備であって、貯留槽(11,12,13)は、液体を排出する排出口(11a,12a,13a)を有し、ポンプ14は、非自吸式のポンプであって、液体を取り込む取り込み口14aを有し、取り込み側配管15aは、貯留槽の排出口とポンプの取り込み口とを接続するように配置され、貯留槽の排出口からポンプの取り込み口まで液体が重力によって流れ落ちるように、取り込み側配管15aに高低差Hが設けられている。【選択図】図2