LIGHT WAVE MEASUREMENT DEVICE AND LIGHT WAVE MEASUREMENT METHOD
To provide a light wave measurement device and a light wave measurement method which develop super-resolution.SOLUTION: A non-scanning type light wave measurement device includes at least: illumination wave irradiation means; reference wave irradiation means; a mask enabling a measuring object to be...
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Zusammenfassung: | To provide a light wave measurement device and a light wave measurement method which develop super-resolution.SOLUTION: A non-scanning type light wave measurement device includes at least: illumination wave irradiation means; reference wave irradiation means; a mask enabling a measuring object to be arranged at a side of the illumination wave irradiation means; an imaging element; and pattern restoration means for restoring an imaging pattern imaged by the imaging element. The mask has an opening where the measuring object is arranged, and a known pattern provided adjacent to the opening. The pattern restoration means has unknown parameter calculation means for calculating a relative position from the known pattern to the imaging element or the like as an unknown parameter using a nonlinear least-squares method, and restoration means for calculating a weight coefficient matrix from a known condition and restoring the imaging pattern by a constrained least-squares method using an acquired light wave and the calculated weight coefficient matrix.SELECTED DRAWING: Figure 3
【課題】超解像性を発現させた光波計測装置及び光波計測方法を提供する。【解決手段】照明波照射手段と、参照波照射手段と、前記照明波照射手段側に測定対象物を配置可能なマスクと、撮像素子と、前記撮像素子で撮像された撮像パターンを復元するパターン復元手段と、を少なくとも備える非走査型の光波計測装置であって、前記マスクは、前記測定対象物の配置位置となる開口部と、該開口部に隣接して設けられた既知パターンとを有し、前記パターン復元手段は、前記既知パターンから撮像素子までの相対位置等を未知パラメータとして非線形最小二乗法によって求める未知パラメータ算出手段と、既知になった条件から重み係数行列を計算し、取得した光波と前記計算した重み係数行列とを使い、制限付き最小二乗法によって前記撮像パターンを復元する復元手段とを有するように構成した。【選択図】図3 |
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