COMPOSITION FOR ELECTROLESS PLATING, CURED PRODUCT FOR ELECTROLESS PLATING, METHOD FOR PRODUCING CURED PRODUCT FOR ELECTROLESS PLATING, WIRING BOARD, AND METHOD FOR PRODUCING WIRING BOARD

To provide a composition for electroless plating that ensures excellent metal deposition by electroless plating and can form a cured film for electroless plating having excellent surface smoothness.SOLUTION: A composition for electroless plating contains (1) a copolymer containing a (meth) acrylate...

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Bibliographische Detailangaben
Hauptverfasser: OTOMO CHIAKI, SUZUKI TAKUMI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a composition for electroless plating that ensures excellent metal deposition by electroless plating and can form a cured film for electroless plating having excellent surface smoothness.SOLUTION: A composition for electroless plating contains (1) a copolymer containing a (meth) acrylate monomer unit having an amino group, a (meth) acrylate monomer unit having a hydroxy group, and a (meth) acrylate monomer unit having a protected carboxy group, and (2) a solvent.SELECTED DRAWING: None 【課題】無電解メッキによる金属の析出性に優れ、表面の平滑性に優れた無電解メッキ用硬化膜を形成可能な無電解メッキ用組成物を提供する。【解決手段】(1)アミノ基を有する(メタ)アクリレート系単量体単位と、水酸基を有する(メタ)アクリレート系単量体単位と、保護されたカルボキシ基を有する(メタ)アクリレート系単量体単位とを有する共重合体と、(2)溶剤とを含有する、無電解メッキ用組成物。【選択図】なし