METAL CONTAMINANT REMOVING DEVICE

To provide a metal contaminant removing device which can accurately remove fine particles (particles) or vaporous metal contaminants of such as metal, metal oxide, and metal halide from process gas.SOLUTION: A metal contaminant removing device is structured of: a cylinder 3 which is arranged on a li...

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1. Verfasser:	SHINDO TOYOHIKO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	To provide a metal contaminant removing device which can accurately remove fine particles (particles) or vaporous metal contaminants of such as metal, metal oxide, and metal halide from process gas.SOLUTION: A metal contaminant removing device is structured of: a cylinder 3 which is arranged on a line 2 in which process gas containing metal contaminants flows, and has an inflow port 4 connected to an upstream side of the line 2 and an outflow port 5 connected to a downstream side of the line 2; and a trap element 100 arranged inside the cylinder 3. The trap element 100 is a porous hollow tube 10 of fluorine resin which communicates with the inflow port 4 at one end, and communicates with the outflow port 5 at the other end, and is arranged by bending in an internal space 6 of the cylinder 3.SELECTED DRAWING: Figure 1 【課題】本発明は、プロセスガスから、金属、金属酸化物、ハロゲン化金属などの微細粒子（パーティクル）又は蒸気状金属汚染物質を精度良く除去することのできる金属汚染物質除去装置を提供する。【解決手段】本発明は、金属汚染物質を含むプロセスガスが流れるライン２上に配設され、前記ライン２の上流側に接続される流入口４及び前記ライン２の下流側と接続される流出口５を有するシリンダ３と、シリンダ３内部に配設されるトラップエレメント１００とによって構成される金属汚染物質除去装置において、前記トラップエレメント１００は、一端が前記流入口４と連通すると共に他端が前記流出口５と連通し、前記シリンダ３の内部空間６に屈曲して配置されるフッ素樹脂製多孔質の中空チューブ１０であることにある。【選択図】図１