HEAT TREATMENT EQUIPMENT

To provide heat treatment equipment enabling the maintenance period thereof to be prolonged by suppressing a growth of a film thickness of a reaction by-product to a blocking member hermetically sealing a reaction chamber.SOLUTION: In the heat treatment equipment, a quarts film forming delay cover c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IMAHORI AKIRA, URASAKI YOSHIHIKO, MAEDA HIDEKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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