EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To suppress decrease in exposure accuracy.SOLUTION: An exposure apparatus includes: a holding stage 10 for holding a semiconductor wafer 110; an adjusting unit 20 for displacing the holding stage 10; a focus sensor 30 for outputting a detection signal corresponding to a surface height of a photoresi...

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Bibliographische Detailangaben
Hauptverfasser:	ICHIKAWA HARUHITO, TAKEI SHINYA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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