EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
To suppress decrease in exposure accuracy.SOLUTION: An exposure apparatus includes: a holding stage 10 for holding a semiconductor wafer 110; an adjusting unit 20 for displacing the holding stage 10; a focus sensor 30 for outputting a detection signal corresponding to a surface height of a photoresi...
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| creator | ICHIKAWA HARUHITO TAKEI SHINYA |
| description | To suppress decrease in exposure accuracy.SOLUTION: An exposure apparatus includes: a holding stage 10 for holding a semiconductor wafer 110; an adjusting unit 20 for displacing the holding stage 10; a focus sensor 30 for outputting a detection signal corresponding to a surface height of a photoresist 100; an exposure unit 60 for transferring a pattern formed in a photomask onto the photoresist 100 by shot exposure; and a control unit 70 for controlling the adjusting unit 20, the focus sensor 30 and the exposure unit 60. The control unit 70 controls at least either the adjusting unit 20 or the focus sensor 30 in such a manner that detection signals corresponding to surface heights of a plurality of detection positions in a portion of the photoresist 100 subjected to the shot exposure are input, and controls the adjusting unit 20 on the basis of the plurality of detection signals to displace the holding stage 10 by tilting, so as to reduce a difference in the surface height at the plurality of detection positions compared to a height difference before tilting the holding stage 10.SELECTED DRAWING: Figure 1
【課題】露光精度が低下することを抑制する。【解決手段】半導体ウェハ１１０を保持する保持ステージ１０と、保持ステージ１０を変位させる調整部２０と、フォトレジスト１００の表面高さに応じた検出信号を出力するフォーカスセンサ３０と、フォトマスクに形成されたパターンをショット露光してフォトレジスト１００に転写する露光部６０と、調整部２０、フォーカスセンサ３０、および露光部６０を制御する制御部７０と、を備える。そして、制御部７０は、フォトレジスト１００のうちのショット露光される部分における複数の検出位置の表面高さに応じた検出信号が入力されるように調整部２０およびフォーカスセンサ３０の少なくとも一方を制御し、複数の検出信号に基づき、調整部２０を制御して保持ステージ１０を傾ける変位をさせることにより、保持ステージ１０を傾ける前に対して複数の検出位置における表面高さの差を小さくするようにする。【選択図】図１ |
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【課題】露光精度が低下することを抑制する。【解決手段】半導体ウェハ１１０を保持する保持ステージ１０と、保持ステージ１０を変位させる調整部２０と、フォトレジスト１００の表面高さに応じた検出信号を出力するフォーカスセンサ３０と、フォトマスクに形成されたパターンをショット露光してフォトレジスト１００に転写する露光部６０と、調整部２０、フォーカスセンサ３０、および露光部６０を制御する制御部７０と、を備える。そして、制御部７０は、フォトレジスト１００のうちのショット露光される部分における複数の検出位置の表面高さに応じた検出信号が入力されるように調整部２０およびフォーカスセンサ３０の少なくとも一方を制御し、複数の検出信号に基づき、調整部２０を制御して保持ステージ１０を傾ける変位をさせることにより、保持ステージ１０を傾ける前に対して複数の検出位置における表面高さの差を小さくするようにする。【選択図】図１</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190808&DB=EPODOC&CC=JP&NR=2019133065A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190808&DB=EPODOC&CC=JP&NR=2019133065A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ICHIKAWA HARUHITO</creatorcontrib><creatorcontrib>TAKEI SHINYA</creatorcontrib><title>EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE</title><description>To suppress decrease in exposure accuracy.SOLUTION: An exposure apparatus includes: a holding stage 10 for holding a semiconductor wafer 110; an adjusting unit 20 for displacing the holding stage 10; a focus sensor 30 for outputting a detection signal corresponding to a surface height of a photoresist 100; an exposure unit 60 for transferring a pattern formed in a photomask onto the photoresist 100 by shot exposure; and a control unit 70 for controlling the adjusting unit 20, the focus sensor 30 and the exposure unit 60. The control unit 70 controls at least either the adjusting unit 20 or the focus sensor 30 in such a manner that detection signals corresponding to surface heights of a plurality of detection positions in a portion of the photoresist 100 subjected to the shot exposure are input, and controls the adjusting unit 20 on the basis of the plurality of detection signals to displace the holding stage 10 by tilting, so as to reduce a difference in the surface height at the plurality of detection positions compared to a height difference before tilting the holding stage 10.SELECTED DRAWING: Figure 1
【課題】露光精度が低下することを抑制する。【解決手段】半導体ウェハ１１０を保持する保持ステージ１０と、保持ステージ１０を変位させる調整部２０と、フォトレジスト１００の表面高さに応じた検出信号を出力するフォーカスセンサ３０と、フォトマスクに形成されたパターンをショット露光してフォトレジスト１００に転写する露光部６０と、調整部２０、フォーカスセンサ３０、および露光部６０を制御する制御部７０と、を備える。そして、制御部７０は、フォトレジスト１００のうちのショット露光される部分における複数の検出位置の表面高さに応じた検出信号が入力されるように調整部２０およびフォーカスセンサ３０の少なくとも一方を制御し、複数の検出信号に基づき、調整部２０を制御して保持ステージ１０を傾ける変位をさせることにより、保持ステージ１０を傾ける前に対して複数の検出位置における表面高さの差を小さくするようにする。【選択図】図１</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxjQjwDw4NclVwDAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9S8HX0C3VzdA4JDfL0c1cIdvX1dPb3cwl1DgHKubiGeTq78jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDS0NjYwMzU0djohQBANlDLIU</recordid><startdate>20190808</startdate><enddate>20190808</enddate><creator>ICHIKAWA HARUHITO</creator><creator>TAKEI SHINYA</creator><scope>EVB</scope></search><sort><creationdate>20190808</creationdate><title>EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE</title><author>ICHIKAWA HARUHITO ; TAKEI SHINYA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2019133065A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ICHIKAWA HARUHITO</creatorcontrib><creatorcontrib>TAKEI SHINYA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ICHIKAWA HARUHITO</au><au>TAKEI SHINYA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE</title><date>2019-08-08</date><risdate>2019</risdate><abstract>To suppress decrease in exposure accuracy.SOLUTION: An exposure apparatus includes: a holding stage 10 for holding a semiconductor wafer 110; an adjusting unit 20 for displacing the holding stage 10; a focus sensor 30 for outputting a detection signal corresponding to a surface height of a photoresist 100; an exposure unit 60 for transferring a pattern formed in a photomask onto the photoresist 100 by shot exposure; and a control unit 70 for controlling the adjusting unit 20, the focus sensor 30 and the exposure unit 60. The control unit 70 controls at least either the adjusting unit 20 or the focus sensor 30 in such a manner that detection signals corresponding to surface heights of a plurality of detection positions in a portion of the photoresist 100 subjected to the shot exposure are input, and controls the adjusting unit 20 on the basis of the plurality of detection signals to displace the holding stage 10 by tilting, so as to reduce a difference in the surface height at the plurality of detection positions compared to a height difference before tilting the holding stage 10.SELECTED DRAWING: Figure 1
【課題】露光精度が低下することを抑制する。【解決手段】半導体ウェハ１１０を保持する保持ステージ１０と、保持ステージ１０を変位させる調整部２０と、フォトレジスト１００の表面高さに応じた検出信号を出力するフォーカスセンサ３０と、フォトマスクに形成されたパターンをショット露光してフォトレジスト１００に転写する露光部６０と、調整部２０、フォーカスセンサ３０、および露光部６０を制御する制御部７０と、を備える。そして、制御部７０は、フォトレジスト１００のうちのショット露光される部分における複数の検出位置の表面高さに応じた検出信号が入力されるように調整部２０およびフォーカスセンサ３０の少なくとも一方を制御し、複数の検出信号に基づき、調整部２０を制御して保持ステージ１０を傾ける変位をさせることにより、保持ステージ１０を傾ける前に対して複数の検出位置における表面高さの差を小さくするようにする。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
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