SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

To provide a substrate processing method and a substrate processing apparatus that shorten a replenishment time of a processing solution.SOLUTION: A substrate processing method according to an embodiment that executes etching processing by immersing a substrate in a processing solution containing a...

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Bibliographische Detailangaben
1. Verfasser:	TAKAYAMA KAZUYA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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