VERTICAL THERMAL TREATMENT APPARATUS

To provide a vertical thermal treatment apparatus capable of reducing adhesion amount of a decomposition product to an inner wall of a gas nozzle, while reducing inclination of the flowing of a gas in a substrate processing region.SOLUTION: A vertical thermal treatment apparatus is a vertical therma...

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Bibliographische Detailangaben
Hauptverfasser: ITABASHI MASARU, OGAWA SATORU, SHIMA HIROMI, KIKAMA HIDEJI, JO TOSHIHIKO, HISHIYA SHINGO, GAO JING SHUO, SUZUKI KEISUKE
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a vertical thermal treatment apparatus capable of reducing adhesion amount of a decomposition product to an inner wall of a gas nozzle, while reducing inclination of the flowing of a gas in a substrate processing region.SOLUTION: A vertical thermal treatment apparatus is a vertical thermal treatment apparatus forming a film by supplying an original gas to a plurality of substrates in a state where the plurality of substrates is almost horizontally held to a substrate holding tool with a prescribed interval in a vertical direction. The vertical thermal treatment apparatus includes: a processing container including an inner pipe housing the substrate holding tool and an outer pipe arranged to an outer side of the inner pipe; and a gas nozzle vertically extended along an inner peripheral surface of the inner pipe, and of which a tip is penetrated to the outer part from the inner part of the inner pipe. In the gas nozzle, a first gas hole supplying the original gas into the inner part of the inner pipe, and a second gas hole supplying the original gas to the outer part of the inner pipe are formed.SELECTED DRAWING: Figure 1 【課題】基板処理領域のガスの流れの偏りを低減しつつ、ガスノズルの内壁への分解物の付着量を低減することが可能な縦型熱処理装置を提供すること。【解決手段】一実施形態の縦型熱処理装置は、基板保持具に複数の基板を上下方向に所定間隔を有して略水平に保持した状態で、前記複数の基板に原料ガスを供給して膜を形成する縦型熱処理装置であって、前記基板保持具を収容する内管と、前記内管の外側に配置される外管と、を含む処理容器と、前記内管の内周面に沿って上下に延びて設けられ、先端が前記内管の内部から外部に貫通するガスノズルと、を有し、前記ガスノズルには、前記内管の内部に前記原料ガスを供給する第1のガス孔と、前記内管の外部に前記原料ガスを供給する第2のガス孔と、が形成されている。【選択図】図1