SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM

To prevent defects of processing caused by a change in a light-emission state by a temperature change of an LED, in an exposure processing device using the LED that is performed after pattern exposure.SOLUTION: A constant time zone during which an LED is made to emit light before exposure as a dummy is set, and a time (Tp) of a time zone of the total of each time zone to the time when dummy light emission, exposure and preparation of carrying-out of a wafer after exposure are completed is made constant. Specifically, a period from the time of carrying-in of the wafer in to a housing to the time point when preparation of carrying-out of the wafer after exposure ends is regarded as 1 cycle. A time zone to start of a subsequent cycle from end of the 1 cycle is regarded as a stand-by time zone. When illuminances at the time of exposure in the dummy light emission are represented by Id and Is and times of the dummy light emission and the exposure are represented by Td and Ts, Id is determined so as to satisfy a relationship of Id=(Tp/Td) Iw-(Ts/Td) Is, and thereby average illuminance in 1 cycle between substrates becomes constant.SELECTED DRAWING: Figure 4 【課題】パターン露光の後に行われる、ＬＥＤを用いた露光処理装置において、ＬＥＤの温度変化により発光状態が変わることに起因して処理に不具合が生じることを避けること。【解決手段】露光前にＬＥＤをダミーで発光させる一定の時間帯を設定し、ダミー発光、露光及び露光後のウエハの搬出の準備が完了するまでの間の各時間帯の合計の時間帯の時間(Ｔｐ)を一定化する。即ちウエハの筐体内への搬入時から、露光後のウエハの搬出準備が終了した時点までを１サイクルとする。１サイクル終了後、次のサイクルの開始までに発生する時間帯を待機時間帯とする。ダミー発光時、露光時の照度を夫々Ｉｄ、Ｉｓ、ダミー発光、露光の時間を夫々Ｔｄ、Ｔｓとすると、Ｉｄ＝（Ｔｐ／Ｔｄ）・Ｉｗ−（Ｔｓ／Ｔｄ）・ＩｓとなるようにＩｄを決めることで基板間における１サイクル内の平均照度が一定となる。【選択図】図４