SPUTTERING DEVICE AND METHOD OF ITS APPLICATION
To provide a sputtering device capable of heightening dischargeability of cooling liquid; and to provide a method of its application.SOLUTION: A sputtering device includes a cyclic first cooling liquid passage R1 formed between a target 110 and a magnet unit 130, through which cooling liquid for coo...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide a sputtering device capable of heightening dischargeability of cooling liquid; and to provide a method of its application.SOLUTION: A sputtering device includes a cyclic first cooling liquid passage R1 formed between a target 110 and a magnet unit 130, through which cooling liquid for cooling the target 110 flows, a second cooling liquid passage R2 provided inside the magnet unit 130, through which the cooling liquid flows, and a drainage device P2 for sending gas for discharging the cooling liquid, from the first cooling liquid passage R1 toward the second cooling liquid passage R2, and has a constitution in which a connection site RJ between the first cooling liquid passage R1 and the second cooling liquid passage R2 can be arranged on a position deviated to the downward vertical direction in the cyclic first cooling liquid passage R1.SELECTED DRAWING: Figure 4
【課題】冷却液の排出性を高めることのできるスパッタ装置及びその使用方法を提供する。【解決手段】ターゲット110とマグネットユニット130との間に形成され、ターゲット110を冷却する冷却液が流れる環状の第1冷却液流路R1と、マグネットユニット130の内部に設けられ、前記冷却液が流れる第2冷却液流路R2と、第1冷却液流路R1から第2冷却液流路R2に向けて、前記冷却液を排出させる気体を送り込む排液装置P2と、を備えると共に、第1冷却液流路R1と第2冷却液流路R2との接続部位RJは、環状の第1冷却液流路R1における鉛直方向下方に偏った位置に配置可能に構成されていることを特徴とする。【選択図】図4 |
---|