IMAGE FORMATION APPARATUS, CORRECTION METHOD OF EXPOSURE POSITION, PROGRAM AND MANUFACTURING METHOD OF TEST CHART FORMATION MEDIUM
To provide an image formation apparatus, a correction method of an exposure position, a program and a manufacturing method of a test chart formation medium which can more precisely correct the deviation of the exposure position that has occurred subsequently.SOLUTION: An image formation apparatus fo...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide an image formation apparatus, a correction method of an exposure position, a program and a manufacturing method of a test chart formation medium which can more precisely correct the deviation of the exposure position that has occurred subsequently.SOLUTION: An image formation apparatus forms an electrostatic latent image in a mirror surface identification pattern that can identify a reference portion formed with scanning by one mirror surface by performing the two-dimensional exposure by making the clock characteristic of the writing clock used in the scanning by the one mirror surface of a rotary polygon mirror different from the clock characteristic related to the other mirror surface, forms an electrostatic latent image in a detection pattern by performing the two-dimensional exposure at a prescribed relative position with respect to the mirror surface identification pattern, identifies the mirror surface used in formation of each section of the detection pattern from the physical relation between the reference portion and the detection pattern on the basis of the reading result of the recording medium formed with the test chart including the mirror surface identification pattern and the detection pattern, and performs correction by detecting the deviation related to each of the plurality of mirror surfaces on the basis of the identification result of the mirror surface and the detection pattern.SELECTED DRAWING: Figure 9
【課題】後発的に生じた露光位置のずれをより正確に補正することができる画像形成装置、露光位置の補正方法、プログラム及びテストチャート形成媒体の製造方法を提供する。【解決手段】回転多面鏡の一の鏡面による走査に用いられる書込クロックのクロック特性と、他の鏡面に係るクロック特性とを異ならせて二次元露光を行わせることで、一の鏡面による走査で形成された基準部分を特定可能な鏡面特定パターンの静電潜像を形成し、鏡面特定パターンに対する所定の相対位置に二次元露光を行わせることで検出パターンの静電潜像を形成し、鏡面特定パターン及び検出パターンを含むテストチャートが形成された記録媒体の読取結果に基づいて、基準部分と検出パターンとの位置関係から検出パターンの各部の形成に用いられた鏡面を特定し、当該鏡面の特定結果と検出パターンとに基づいて複数の鏡面の各々に係るずれを検出して補正する。【選択図】図9 |
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