METHOD FOR MANUFACTURING SUBSTRATE WITH CONDUCTIVE PATTERN AND SUBSTRATE WITH CONDUCTIVE PATTERN

To provide a substrate with a conductive pattern which has excellent conductivity and in which the conductive pattern is hard to be visibly recognized, and a method for manufacturing the same.SOLUTION: A method for manufacturing a substrate with a conductive pattern includes the steps of: forming a...

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Bibliographische Detailangaben
Hauptverfasser: ISHIHARA MIHARU, TAKAGI MICHIO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a substrate with a conductive pattern which has excellent conductivity and in which the conductive pattern is hard to be visibly recognized, and a method for manufacturing the same.SOLUTION: A method for manufacturing a substrate with a conductive pattern includes the steps of: forming a conductive layer including silver particles and a resin on the substrate; forming a resin layer on the conductive layer; pattern-forming at least the conductive layer and the resin layer by a photolithography method; and bringing the pattern of at least the conductive layer into contact with a hydrochloric acid aqueous solution which contains palladium, tellurium, and/or the compound thereof and in which pH is less than or equal to 3.SELECTED DRAWING: Figure 1 【課題】導電性に優れ、導電パターンが視認されにくい導電パターン付き基板とその製造方法を提供すること。【解決手段】基板上に、銀粒子と樹脂を含む導電層を形成する工程、前記導電層上に、樹脂層を形成する工程、フォトリソグラフィー法により、少なくとも前記導電層と樹脂層をパターン形成する工程および少なくとも導電層の前記パターンを、パラジウム、テルルおよび/またそれらの化合物を含有し、pHが3以下である塩酸水溶液と接触させる工程を含む、導電パターン付き基板の製造方法。【選択図】図1