DISPLAY DEVICE
To provide a display device which improves a degree of design freedom of wiring arranged in a peripheral region.SOLUTION: A display device comprises: a first substrate including a display region and a peripheral region outside the display region; a transistor disposed in the display region on the fi...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a display device which improves a degree of design freedom of wiring arranged in a peripheral region.SOLUTION: A display device comprises: a first substrate including a display region and a peripheral region outside the display region; a transistor disposed in the display region on the first substrate, and including a semiconductor layer, a gate electrode facing the semiconductor layer, a gate insulation film between the gate electrode and the semiconductor layer, and source/drain electrodes electrically connected to the semiconductor layer; a first wiring layer which is disposed in the peripheral region on the first substrate, electrically connected to the transistor, and arranged at a position closer to the first substrate than a position of the same layer as the gate electrode and the source/drain electrodes of the transistor; a second wiring layer which is disposed on the first substrate with the first wiring layer in between, and has an electric potential different from the electric potential of the first wiring layer; and an insulation film arranged between the second wiring layer and the first wiring layer.SELECTED DRAWING: Figure 4
【課題】周辺領域に設けられる配線の設計の自由度を向上させることが可能な表示装置を提供する。【解決手段】表示領域および前記表示領域の外側の周辺領域が設けられた第1基板と、前記第1基板上の前記表示領域に設けられ、半導体層と、前記半導体層に対向するゲート電極と、前記ゲート電極と前記半導体層との間のゲート絶縁膜と、前記半導体層に電気的に接続されたソース・ドレイン電極とを有するトランジスタと、前記第1基板上の前記周辺領域に設けられ、前記トランジスタに電気的に接続されるとともに、前記トランジスタの前記ゲート電極および前記ソース・ドレイン電極と同層の位置よりも前記第1基板に近い位置に配置された第1配線層と、前記第1配線層を間にして前記第1基板上に設けられ、前記第1配線層の電位と異なる電位を有する第2配線層と、前記第2配線層と前記第1配線層との間に設けられた絶縁膜とを備えた表示装置。【選択図】図4 |
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