SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

To improve short-circuit resistance in an SiC semiconductor device.SOLUTION: An n-type source region 8 is configured by a first source region 8a with relatively low concentration, and a second source region 8b with higher concentration than the first source region 8a. Thereby, a saturation current v...

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Hauptverfasser: TAKEUCHI YUICHI, YAMASHITA YUSUKE, KAJI AIKO, SUZUKI RYUTA, MINOTANI SHUHEI
Format: Patent
Sprache:eng ; jpn
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