PLASMA PROCESSING APPARATUS

To match the impedance on the microwave output device side and the impedance on the chamber side appropriately.SOLUTION: The apparatus includes a chamber body, a microwave generating part generating a microwave having a bandwidth, a waveguide connecting a microwave output device and the chamber body...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FUNASAKI KAZUNORI, FUKADA KENSUKE, KANEKO KAZUFUMI, UCHIDA YUKINORI, ITAYA KOJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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