DIFFRACTION OPTICAL ELEMENT, LIGHT IRRADIATION DEVICE, LIGHT IRRADIATION SYSTEM AND CORRECTION METHOD OF PROJECTION PATTERN
To provide a diffraction optical element capable of easily correcting distortion caused by an imaging lens, a light irradiation device, a light irradiation system and a correction method of a projection pattern.SOLUTION: A diffraction optical element 10 is a diffraction optical element for shaping l...
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| Sprache: | eng ; jpn |
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| Zusammenfassung: | To provide a diffraction optical element capable of easily correcting distortion caused by an imaging lens, a light irradiation device, a light irradiation system and a correction method of a projection pattern.SOLUTION: A diffraction optical element 10 is a diffraction optical element for shaping light and includes a diffraction grating that projects a first projection pattern 23 as a projection pattern projected by diffracting incident light to exit, and a position reference pattern 24 that is a projection pattern different from the first projection pattern 23, for specifying a position in the projection pattern.SELECTED DRAWING: Figure 5
【課題】撮影レンズに起因する歪みを簡単に修正できる回折光学素子、光照射装置、光照射システム、投影パターンの補正方法を提供する。【解決手段】回折光学素子１０は、光を整形する回折光学素子であって、入射した光を回折して出射することにより投影される投影パターンとして、第１の投影パターン２３と、第１の投影パターン２３とは別の投影パターンであって、投影パターンにおける位置を特定する位置基準パターン２４と、を投影する回折格子を備える。【選択図】図５ |
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