LASER PROCESSING METHOD

To form a hole that hardly causes a conductive treatment failure by laser processing.SOLUTION: A laser processing method forms a hole 11 in a liquid crystal panel 1 by radiating a pulse laser beam 2 to the liquid crystal panel 1 including glass plates 3, 4. The laser processing method controls an am...

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Bibliographische Detailangaben
Hauptverfasser: ITO SHO, HITAI YOJI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To form a hole that hardly causes a conductive treatment failure by laser processing.SOLUTION: A laser processing method forms a hole 11 in a liquid crystal panel 1 by radiating a pulse laser beam 2 to the liquid crystal panel 1 including glass plates 3, 4. The laser processing method controls an amount of adherent matter X constituted of a molten scattering matter Y at a wall surface of the hole 11 while imaging a formation position of the hole 11 by a camera 12 through an end surface of the liquid crystal panel 1, in the step of forming the hole 11.SELECTED DRAWING: Figure 1 【課題】レーザー加工により、導電処理不良が生じにくい穴を形成する。【解決手段】ガラス板3,4を含む液晶パネル1にパルスレーザー2を照射することで、液晶パネル1に穴11を形成するレーザー加工方法であって、穴11の形成過程において、液晶パネル1の端面を通じて穴11の形成位置をカメラ12で撮影しながら、穴11の壁面における溶融飛散物Yからなる付着物Xの量を制御する。【選択図】図1