TEMPLATE, NITRIDE SEMICONDUCTOR ULTRAVIOLET LIGHT-EMITTING ELEMENT, AND MANUFACTURING METHOD FOR TEMPLATE

To provide a nitride semiconductor ultraviolet light-emitting element dramatically improving crystallinity.SOLUTION: A template comprises: a sapphire substrate taking, as its main face, a (0001) face or a face tilted from the (0001) face by a predetermined angle; and an AlN layer constituted by an A...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HIRANO HIKARI, NAGASAWA AKISUKE
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:To provide a nitride semiconductor ultraviolet light-emitting element dramatically improving crystallinity.SOLUTION: A template comprises: a sapphire substrate taking, as its main face, a (0001) face or a face tilted from the (0001) face by a predetermined angle; and an AlN layer constituted by an AlN crystal having a crystal orientation relation epitaxial with a main face directly formed on the main face of the sapphire substrate. In the template, an average particle diameter of the AIN crystal with a thickness of 20nm from the main face of the AlN layer is 100nm or less. The main face's 90% or more is covered with the AlN crystal having the average particle diameter of 100nm or less with the thickness of 20nm from the main face of the AlN layer.SELECTED DRAWING: Figure 3 【課題】結晶性を劇的に改善する窒化物半導体紫外線発光素子の提供。【解決手段】テンプレートは、(0001)面または(0001)面に対して所定の角度だけ傾斜した面を主面とするサファイア基板と、サファイア基板の主面に直接形成される主面に対してエピタキシャルな結晶方位関係を有するAlN結晶で構成されたAlN層と、を備える。テンプレートにおいて、AlN層の主面から20nmの厚さにおけるAlN結晶の平均粒径は、100nm以下であり、前記AlN層の主面から20nmの厚さにおける平均粒径が100nm以下の前記AlN結晶が、主面の90%以上を被覆している。【選択図】図3