DEVELOPER CONCENTRATION MANAGEMENT DEVICE AND SUBSTRATE DEVELOPMENT PROCESSING SYSTEM

To provide a developer concentration management device and a substrate development processing system that are optimum for a role of managing developer to be used for development of a substrate into an optimum state.SOLUTION: A substrate processing system includes a developer concentration management device B, a development processing device A, a preparation device E for preparing new developer, and a regeneration device F for performing regeneration on developer after use, the devices being connected using piping. The developer concentration management device A measures a physical property or constituent concentration of developer of the development processing device B and supplies an undiluted solution, new solution, or regenerating solution for the developer to manage the developer so that a concentration of the developer is optimum. Supplied replenisher is measured by integrating flow meters 151, 152, 153, 154, 155 provided on the piping. On the basis of an integrated flow rate of the replenisher measured by the integrating flow meters 151, 152, 153, 154, 155, calculation of a charge for developer concentration management or a charge for substrate development processing is enabled.SELECTED DRAWING: Figure 1 【課題】基板の現像に用いられる現像液を最適な状態に管理する役務に最適な現像液の濃度管理装置及び基板の現像処理システムを提供する。【解決手段】基板処理システムは、現像液の濃度管理装置Ｂ、現像処理装置Ａ、現像液の新液を調製する調製装置Ｅ、使用後の現像液を再生する再生装置Ｆとが、配管で接続されている。現像液の濃度管理装置Ａは、現像処理装置Ｂの現像液の物性または成分濃度を測定し、現像液の原液や新液、再生液を供給し、現像液を最適な濃度に管理する。供給された補充液は、配管に設けられた積算流量計１５１、１５２、１５３、１５４、１５５により計測される。積算流量計１５１、１５２、１５３、１５４、１５５により計測された補充液の積算流量に基づいて、現像液の濃度管理の料金、または、基板の現像処理料金の算出が可能となる。【選択図】図１