SLIDING MEMBER AND PRODUCTION METHOD OF SLIDING MEMBER

To provide a sliding member that has an excellent slidability and abrasion resistance.SOLUTION: A sliding member 1 of the embodiment comprises: a sliding substrate 2; a pure copper plating layer 3 formed on the surface of the sliding substrate 2; and a complex copper plating layer 4 formed on the pu...

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Bibliographische Detailangaben
Hauptverfasser:	ISHII KAZUYA, KIMOTO MASAYA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS TRANSPORTING
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Beschreibung
Zusammenfassung:	To provide a sliding member that has an excellent slidability and abrasion resistance.SOLUTION: A sliding member 1 of the embodiment comprises: a sliding substrate 2; a pure copper plating layer 3 formed on the surface of the sliding substrate 2; and a complex copper plating layer 4 formed on the pure copper plating layer 3. The complex copper plating layer 4 comprises a plurality of massive parts 5 including copper and graphite 6. The Vickers hardness of the complex copper plating layer 4 is 120 or lower.SELECTED DRAWING: Figure 1 【課題】摺動性及び耐摩耗性に優れる摺動部材を提供する。【解決手段】本実施形態による摺動部材１は、摺動基材２と、摺動基材２の表面上に形成されている純銅めっき層３と、純銅めっき層３の上に形成されている複合銅めっき層４とを備える。複合銅めっき層４は、銅とグラファイト６とを含有する複数の塊状部５を備える。複合銅めっき層４のビッカース硬さは、１２０以下である。【選択図】図１