POLISHING DEVICE AND SUBSTRATE PROCESSING DEVICE

PROBLEM TO BE SOLVED: To provide a polishing device which can reduce power usage of the entire device, and to provide a substrate processing device.SOLUTION: A polishing module 21 has: a polishing table 23 having a polishing pad 22 to which a substrate W is pressed; a motor 23a which rotates the pol...

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Bibliographische Detailangaben
1. Verfasser: ISOKAWA HIDETATSU
Format: Patent
Sprache:eng ; jpn
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