METHOD OF AND APPARATUS FOR SUPPLY AND RECOVERY OF TARGET MATERIAL
PROBLEM TO BE SOLVED: To supply a droplet generator with target material and remove unused target material without requiring excessive downtime.SOLUTION: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir which m...
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| creator | PETER M BAUMGART CHIRAG RAJYAGURU THEODOSIOS SYRPIS SANJEEV SESHAGIRI J MARTIN ALGOTS GEORGIY O VASCHENKO JEFFREY GACUTAN |
| description | PROBLEM TO BE SOLVED: To supply a droplet generator with target material and remove unused target material without requiring excessive downtime.SOLUTION: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir which may be replenished with the target material while a nozzle portion of the droplet generator is maintained at a temperature. Also disclosed is a system for selectively draining the spent target material.SELECTED DRAWING: Figure 3
【課題】過剰な時間のロスを必要とせず液滴ジェネレータにターゲット材料を供給しかつ未使用のターゲット材料を除去する。【解決手段】液滴ジェネレータのノズル部分の温度が維持されている間にターゲット材料が補充され得るターゲット材料リザーバを有する液滴ジェネレータを備え得るＥＵＶ光源ターゲット材料取扱システムが開示される。選択的に使用済みターゲット材料を排出するためのシステムも開示される。【選択図】図３ |
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【課題】過剰な時間のロスを必要とせず液滴ジェネレータにターゲット材料を供給しかつ未使用のターゲット材料を除去する。【解決手段】液滴ジェネレータのノズル部分の温度が維持されている間にターゲット材料が補充され得るターゲット材料リザーバを有する液滴ジェネレータを備え得るＥＵＶ光源ターゲット材料取扱システムが開示される。選択的に使用済みターゲット材料を排出するためのシステムも開示される。【選択図】図３</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; X-RAY TECHNIQUE</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181122&DB=EPODOC&CC=JP&NR=2018185548A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181122&DB=EPODOC&CC=JP&NR=2018185548A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PETER M BAUMGART</creatorcontrib><creatorcontrib>CHIRAG RAJYAGURU</creatorcontrib><creatorcontrib>THEODOSIOS SYRPIS</creatorcontrib><creatorcontrib>SANJEEV SESHAGIRI</creatorcontrib><creatorcontrib>J MARTIN ALGOTS</creatorcontrib><creatorcontrib>GEORGIY O VASCHENKO</creatorcontrib><creatorcontrib>JEFFREY GACUTAN</creatorcontrib><title>METHOD OF AND APPARATUS FOR SUPPLY AND RECOVERY OF TARGET MATERIAL</title><description>PROBLEM TO BE SOLVED: To supply a droplet generator with target material and remove unused target material without requiring excessive downtime.SOLUTION: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir which may be replenished with the target material while a nozzle portion of the droplet generator is maintained at a temperature. Also disclosed is a system for selectively draining the spent target material.SELECTED DRAWING: Figure 3
【課題】過剰な時間のロスを必要とせず液滴ジェネレータにターゲット材料を供給しかつ未使用のターゲット材料を除去する。【解決手段】液滴ジェネレータのノズル部分の温度が維持されている間にターゲット材料が補充され得るターゲット材料リザーバを有する液滴ジェネレータを備え得るＥＵＶ光源ターゲット材料取扱システムが開示される。選択的に使用済みターゲット材料を排出するためのシステムも開示される。【選択図】図３</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDydQ3x8HdR8HdTcPRzUXAMCHAMcgwJDVZw8w9SCA4NCPCJBEsEuTr7h7kGRYIUhjgGubuGKPg6hrgGeTr68DCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwNDC0MLU1MTC0djohQBAD4fK4w</recordid><startdate>20181122</startdate><enddate>20181122</enddate><creator>PETER M BAUMGART</creator><creator>CHIRAG RAJYAGURU</creator><creator>THEODOSIOS SYRPIS</creator><creator>SANJEEV SESHAGIRI</creator><creator>J MARTIN ALGOTS</creator><creator>GEORGIY O VASCHENKO</creator><creator>JEFFREY GACUTAN</creator><scope>EVB</scope></search><sort><creationdate>20181122</creationdate><title>METHOD OF AND APPARATUS FOR SUPPLY AND RECOVERY OF TARGET MATERIAL</title><author>PETER M BAUMGART ; CHIRAG RAJYAGURU ; THEODOSIOS SYRPIS ; SANJEEV SESHAGIRI ; J MARTIN ALGOTS ; GEORGIY O VASCHENKO ; JEFFREY GACUTAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2018185548A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>PETER M BAUMGART</creatorcontrib><creatorcontrib>CHIRAG RAJYAGURU</creatorcontrib><creatorcontrib>THEODOSIOS SYRPIS</creatorcontrib><creatorcontrib>SANJEEV SESHAGIRI</creatorcontrib><creatorcontrib>J MARTIN ALGOTS</creatorcontrib><creatorcontrib>GEORGIY O VASCHENKO</creatorcontrib><creatorcontrib>JEFFREY GACUTAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PETER M BAUMGART</au><au>CHIRAG RAJYAGURU</au><au>THEODOSIOS SYRPIS</au><au>SANJEEV SESHAGIRI</au><au>J MARTIN ALGOTS</au><au>GEORGIY O VASCHENKO</au><au>JEFFREY GACUTAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF AND APPARATUS FOR SUPPLY AND RECOVERY OF TARGET MATERIAL</title><date>2018-11-22</date><risdate>2018</risdate><abstract>PROBLEM TO BE SOLVED: To supply a droplet generator with target material and remove unused target material without requiring excessive downtime.SOLUTION: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir which may be replenished with the target material while a nozzle portion of the droplet generator is maintained at a temperature. Also disclosed is a system for selectively draining the spent target material.SELECTED DRAWING: Figure 3
【課題】過剰な時間のロスを必要とせず液滴ジェネレータにターゲット材料を供給しかつ未使用のターゲット材料を除去する。【解決手段】液滴ジェネレータのノズル部分の温度が維持されている間にターゲット材料が補充され得るターゲット材料リザーバを有する液滴ジェネレータを備え得るＥＵＶ光源ターゲット材料取扱システムが開示される。選択的に使用済みターゲット材料を排出するためのシステムも開示される。【選択図】図３</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE |
| title | METHOD OF AND APPARATUS FOR SUPPLY AND RECOVERY OF TARGET MATERIAL |
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