METHOD OF AND APPARATUS FOR SUPPLY AND RECOVERY OF TARGET MATERIAL

PROBLEM TO BE SOLVED: To supply a droplet generator with target material and remove unused target material without requiring excessive downtime.SOLUTION: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir which m...

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Bibliographische Detailangaben
Hauptverfasser:	PETER M BAUMGART, CHIRAG RAJYAGURU, THEODOSIOS SYRPIS, SANJEEV SESHAGIRI, J MARTIN ALGOTS, GEORGIY O VASCHENKO, JEFFREY GACUTAN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To supply a droplet generator with target material and remove unused target material without requiring excessive downtime.SOLUTION: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir which may be replenished with the target material while a nozzle portion of the droplet generator is maintained at a temperature. Also disclosed is a system for selectively draining the spent target material.SELECTED DRAWING: Figure 3 【課題】過剰な時間のロスを必要とせず液滴ジェネレータにターゲット材料を供給しかつ未使用のターゲット材料を除去する。【解決手段】液滴ジェネレータのノズル部分の温度が維持されている間にターゲット材料が補充され得るターゲット材料リザーバを有する液滴ジェネレータを備え得るＥＵＶ光源ターゲット材料取扱システムが開示される。選択的に使用済みターゲット材料を排出するためのシステムも開示される。【選択図】図３