FREEZING CLEANING DEVICE

PROBLEM TO BE SOLVED: To provide a freezing cleaning device which achieves improvement of performance of removing fine particles.SOLUTION: A freezing cleaning device includes: a table which holds a processed substrate having a first surface and a second surface opposite to the first surface; a liqui...

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Bibliographische Detailangaben
Hauptverfasser: INUKAI MINAKO, OTSUBO KYO, SAKURAI HIDEAKI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a freezing cleaning device which achieves improvement of performance of removing fine particles.SOLUTION: A freezing cleaning device includes: a table which holds a processed substrate having a first surface and a second surface opposite to the first surface; a liquid supply part which supplies a cleaning fluid onto the second surface of the processed substrate which is placed with the first surface facing the table; and a cooling gas discharge part which is provided at the table and supplies a cooling gas to the first surface side of the processed substrate. A gap between the table and the processed substrate is set so that the cooling gas can flow between the table and the processed substrate as laminar flow.SELECTED DRAWING: Figure 1 【課題】微細なパーティクルに対する除去性能を向上させた凍結洗浄装置を提供する。【解決手段】凍結洗浄装置は、第1面と、前記第1面とは反対側の第2面と、を有する被処理基板を保持するテーブルと、前記第1面を前記テーブルに向けて載置された前記被処理基板の前記第2面上に洗浄液を供給する液供給部と、前記テーブルに設けられ、前記被処理基板の第1面側に冷却ガスを供給する冷却ガス放出部と、を備える。前記テーブルと前記被処理基板との間隔は、前記冷却ガスが前記テーブルと前記被処理基板との間を層流として流れるように設定される。【選択図】図1