LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces or eliminates error resulting from absorption of radiation by the patterning device.SOLUTION: A lithographic apparatus has: a support structure MT configured to support a patterning device MA, the patterning device serving to pat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JAN WESTERLAKEN, MARTINUS LEENDERS, PETER DELMASTRO, RUUD BLOKS, THIBAULT LAURENT, SAMIA A NAYEF, MARK SCHUSTER, JUSTIN MATTHEW VERDIRAME, FRANK VAN BOXTEL, CHRISTOPHER WARD
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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