LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces or eliminates error resulting from absorption of radiation by the patterning device.SOLUTION: A lithographic apparatus has: a support structure MT configured to support a patterning device MA, the patterning device serving to pat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JAN WESTERLAKEN, MARTINUS LEENDERS, PETER DELMASTRO, RUUD BLOKS, THIBAULT LAURENT, SAMIA A NAYEF, MARK SCHUSTER, JUSTIN MATTHEW VERDIRAME, FRANK VAN BOXTEL, CHRISTOPHER WARD
Format: Patent
Sprache:eng ; jpn
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces or eliminates error resulting from absorption of radiation by the patterning device.SOLUTION: A lithographic apparatus has: a support structure MT configured to support a patterning device MA, the patterning device serving to pattern a radiation beam B according to a desired pattern and having a planar main surface 12 through which the radiation beam passes; an outlet opening 100 configured to direct a flow of a gas onto the patterning device MA; and an inlet opening 150 configured to extract the gas which has exited the outlet opening 100; where the outlet opening 100 and inlet opening 150 are in a facing surface facing the main surface 12 of the patterning device MA.SELECTED DRAWING: Figure 6 【課題】パターニングデバイスによる放射の吸収により生じるエラーを減少または削減するリソグラフィ装置を提供する。【解決手段】リソグラフィ装置は、所望のパターンに従って放射ビームＢをパターン付けするように機能しかつ放射ビームが通過する主要平面１２を有するパターニングデバイスＭＡを支持するように構成されたサポート構造ＭＴと、ガス流をパターニングデバイスＭＡ上に誘導するように構成された出口開口部１００と、出口開口部１００から出たガスを抽出するように構成された入口開口部１５０とを有する。出口開口部１００および入口開口部１５０は、パターニングデバイスＭＡの主要平面１２に面した対向面にある。【選択図】図６