SCANNING ELECTRON MICROSCOPE

PROBLEM TO BE SOLVED: To provide a scanning electron microscope in which secondary electron can be detected by a secondary electron detector, while preventing contamination of a reflection electron detector during processing.SOLUTION: A scanning electron microscope 100 having a charged particle beam device for processing a specimen with charged particles includes an electron source, a secondary electron detector 30 for detecting secondary electrons generated in the specimen, a reflection electron detector 40 placed closer to the electron source side than the detection surface 32 of the secondary electron detector 30, and detecting the reflection electrons generated in the specimen, a shield plate 50 for shielding the detection surface 42 of the reflection electron detector 40, and a movement mechanism 60 for moving the shield plate 50. In a state where the movement mechanism 60 moved the shield plate 50 so as to shield the detection surface 42 of the reflection electron detector 40, the shield plate 50 is located between the detection surface 42 of the reflection electron detector 40 and the detection surface 32 of the secondary electron detector 30.SELECTED DRAWING: Figure 2 【課題】加工時に、反射電子検出器の汚損を防ぎつつ二次電子検出器による二次電子の検出が可能な走査電子顕微鏡を提供する。【解決手段】走査電子顕微鏡１００では、荷電粒子で試料を加工する荷電粒子装置を備えた走査電子顕微鏡であって、電子源と、試料で発生した二次電子を検出する二次電子検出器３０と、二次電子検出器３０の検出面３２よりも電子源側に配置され、試料で発生した反射電子を検出する反射電子検出器４０と、反射電子検出器４０の検出面４２を遮蔽するための遮蔽板５０と、遮蔽板５０を移動させる移動機構６０と、を含み、反射電子検出器４０の検出面４２が遮蔽されるように移動機構６０が遮蔽板５０を移動させた状態において、遮蔽板５０は、反射電子検出器４０の検出面４２と二次電子検出器３０の検出面３２との間に位置している。【選択図】図２