SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSPORTING METHOD

PROBLEM TO BE SOLVED: To provide a substrate processing system by which the scattering of particles can be suppressed.SOLUTION: A substrate processing system according to an embodiment comprises: a carrier transport region for transporting a carrier, containing a substrate, to a substrate processing device; a substrate transport region for transporting the substrate contained in the carrier to a treatment furnace, separated off from the carrier transport region by a partition wall; a transporting hole formed in the partition wall for transporting the substrate between the carrier transport region and the substrate transport region; an opening/closing door for opening and closing the transporting hole; and pressure equalization means for making a pressure of the substrate transport region, and a pressure of a space surrounded by the carrier and the opening/closing door generally identical to each other.SELECTED DRAWING: Figure 3 【課題】パーティクルの飛散を抑制することが可能な基板処理システムを提供すること。【解決手段】一実施形態の基板処理システムは、基板を収容するキャリアを基板処理装置に対して搬送するためのキャリア搬送領域と、前記キャリア搬送領域と隔壁により仕切られ、前記キャリアに収容される前記基板を処理炉に搬送するための基板搬送領域と、前記隔壁に形成され、前記キャリア搬送領域と前記基板搬送領域との間で前記基板を搬送するための搬送口と、前記搬送口を開閉する開閉ドアと、前記基板搬送領域の圧力と、前記キャリアと前記開閉ドアとに囲まれる空間の圧力と、を略同圧にする同圧化手段と、を備える。【選択図】図３