DIODE LASER BASED WIDE BAND LIGHT SOURCE FOR WAFER INSPECTION TOOL

PROBLEM TO BE SOLVED: To provide a method and a device for performing inspection or measurement of a semiconductor device.SOLUTION: A device comprises a plurality of laser diode arrays 102 that can be configured to provide incident beams having different wavelength ranges. The device also comprises:...

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Bibliographische Detailangaben
Hauptverfasser:	RUDOLF BRUNNER, ANANT CHIMMALGI, YOUNUS VORA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method and a device for performing inspection or measurement of a semiconductor device.SOLUTION: A device comprises a plurality of laser diode arrays 102 that can be configured to provide incident beams having different wavelength ranges. The device also comprises: an optics 106 for directing an incident beam toward a sample; a detector 126 that produces an output signal or an image on the basis of an output beam emitted from the sample responsive to the incident beam; and an optics 124 for directing the output beam to the detector. The device further comprises a controller 110 for constituting a laser diode array 102 to provide incident beams having different wavelength ranges, and detecting a fault of the sample or characterizing a characteristic on the basis of the output signal or the image.SELECTED DRAWING: Figure 7 【課題】半導体デバイスの検査または計測を実行するための方法および装置を提供する。【解決手段】装置は、異なる波長範囲を有する入射ビームを提供するように構成可能な複数のレーザーダイオードアレイ１０２を含む。また、装置は、入射ビームを試料に向けて方向付けるためのオプティクス１０６と、入射ビームに応答して試料から発せられる出力ビームに基づいて出力信号または像を発生させるための検出器１２６と、出力ビームを検出器に向けて方向付けるためのオプティクス１２４とも含む。装置は、異なる波長範囲で入射ビームを提供するようにレーザーダイオードアレイ１０２を構成し、かつ出力信号または像に基づいて試料の欠陥を検出するか、または特徴を特徴付けるためのコントローラ１１０をさらに含む。【選択図】図７