ALUMINUM FOIL LAMINATE AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide an aluminum foil laminate capable of maintaining a total reflectance of 75% or more to deep ultraviolet having a wavelength range of 254 nm or more and 265 nm or less even after being immersed in tap water, and a method for manufacturing the same.SOLUTION: An aluminu...

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Bibliographische Detailangaben
Hauptverfasser:	SHINGU SUSUMU, OYAGI MITSUNARI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS CHEMISTRY FERROUS OR NON-FERROUS ALLOYS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL METALLURGY PERFORMING OPERATIONS PUNCHING METAL ROLLING OF METAL TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an aluminum foil laminate capable of maintaining a total reflectance of 75% or more to deep ultraviolet having a wavelength range of 254 nm or more and 265 nm or less even after being immersed in tap water, and a method for manufacturing the same.SOLUTION: An aluminum foil laminate comprises: aluminum foil 2 having 2% or less of the total surface area of a crystallized product existing in a region having a predetermined surface area to the surface area of the region and 2 μmor less of the average surface area per one crystallized product; and a protective layer 3 formed on the region. A material constituting the protective layer 3 includes a silicone composition. The protective layer 3 has a thickness of 53 nm or more and 89 nm or less and a surface roughness Ra of 10 nm or less.SELECTED DRAWING: Figure 2 【課題】水道水に浸漬された後にも、波長域２５４ｎｍ以上２６５ｎｍ以下の深紫外線に対する全反射率が７５％以上に維持され得るアルミニウム箔積層体およびその製造方法を提供する。【解決手段】予め定められた表面積の領域内に存在する晶出物の総表面積が上記領域の表面積に対して２％以下であり、晶出物の１個当たりの平均表面積が２μｍ2以下であるアルミニウム箔２と、上記領域上に形成された保護層３とを備える。保護層３を構成する材料はシリコーン組成物を含む。保護層３の厚みが５３ｎｍ以上８９ｎｍ以下である。保護層３の表面の表面粗さＲａが１０ｎｍ以下である。【選択図】図２