MANUFACTURING METHOD OF TRANSPARENT GAS BARRIER FILM

PROBLEM TO BE SOLVED: To provide a manufacturing method of a large-area low-cost transparent gas barrier film having an excellent transparency, a gas barrier property, and adhesion by a simple vapor evaporation apparatus.SOLUTION: In a vacuum chamber 1, an unwinding part 3 continuously feeding out a...

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Bibliographische Detailangaben
Hauptverfasser: SAKAMOTO KEITARO, MUROFUSHI YOSHIRO, FUKUDA KAZUO, ISHII SATOSHI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing method of a large-area low-cost transparent gas barrier film having an excellent transparency, a gas barrier property, and adhesion by a simple vapor evaporation apparatus.SOLUTION: In a vacuum chamber 1, an unwinding part 3 continuously feeding out a plastic film 13, a winding part 4 winding the plastic film 13, a cooling drum 5 disposed between the unwinding part 3 and the winding part 4, an evaporation source 6 facing the cooling drum 5, and a magnetic pole 8 disposed inside the cooling drum 5 to generate a magnetron type magnetic field on a deposit surface of the plastic film 13 are disposed. Reactive evaporation of a metal and oxygen gas is enhanced by generating a magnetron discharge on the deposit surface of the plastic film 13 by applying an AC voltage to the cooling drum 5 from an AC power source 11.SELECTED DRAWING: Figure 1 【課題】簡易な蒸着装置によって大面積で低コストかつ透明性とガスバリア性能と密着性に優れた透明ガスバリア性フィルム製造方法の提供。【解決手段】真空槽1内に配置された、プラスチックフィルム13を連続的に繰り出す巻出し部3と、プラスチックフィルム13を巻き取る巻取部4と、巻出し部3と巻取部4との間に配置された冷却ドラム5と、冷却ドラム5に対向配置の蒸着源6と、プラスチックフィルム13の成膜面上にマグネトロン方式の磁場が形成されるよう冷却ドラム5の内部に磁極8が配置され、冷却ドラム5に交流電源11より交流電圧を印加することによりマグネトロン放電をプラスチックフィルム13の成膜面上に発生させることで、金属と酸素ガスとの反応性蒸着を促進することを特徴とする透明ガスバリア性フィルムの製造方法。【選択図】図1