INSPECTION APPARATUS

PROBLEM TO BE SOLVED: To inspect cracks inside a wafer accurately with a simple and inexpensive configuration.SOLUTION: An inspection apparatus for inspecting cracks (C) inside a wafer (W) includes: a holding table (30) for holding the wafer; an illuminator (56) with an optical axis tilted at a firs...

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Bibliographische Detailangaben
Hauptverfasser: IDA KAZUHIKO, TAKEDA NOBORU, YANO HIROHIDE
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To inspect cracks inside a wafer accurately with a simple and inexpensive configuration.SOLUTION: An inspection apparatus for inspecting cracks (C) inside a wafer (W) includes: a holding table (30) for holding the wafer; an illuminator (56) with an optical axis tilted at a first angle (θ1) relative to a direction perpendicular to the upper surface of the wafer; a camera (57) with an optical axis tilted toward an incident side of inspection light by a second angle (θ2) smaller than the first angle relative to the direction perpendicular to the upper surface of the wafer; and rotating means for relatively rotating the holding table relative to the illuminator and the camera.SELECTED DRAWING: Figure 4 【課題】簡易かつ安価な構成でウエーハの内部のクラックを精度よく検査すること。【解決手段】ウエーハ(W)の内部のクラック(C)を検査する検査装置が、ウエーハを保持する保持テーブル(30)と、ウエーハの上面に対して垂直な方向に対して第1の角度(θ1)で光軸を傾けた照明(56)と、ウエーハの上面に対して垂直な方向に対して検査光の入射側に第1の角度よりも小さな第2の角度(θ2)で光軸を傾けたカメラ(57)と、照明及びカメラに対して保持テーブルを相対的に回転させる回転手段とを備える構成にした。【選択図】図4