APPARATUS AND METHOD FOR GROWING OXIDE SINGLE CRYSTAL

PROBLEM TO BE SOLVED: To provide an apparatus for growing an oxide single crystal, capable of corresponding to low cost, and a large diameter and long size of the oxide single crystal.SOLUTION: An apparatus 100 for growing an oxide single crystal comprises: a heat insulator 7 surrounding a heating s...

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1. Verfasser: TERAJIMA AKIRA
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an apparatus for growing an oxide single crystal, capable of corresponding to low cost, and a large diameter and long size of the oxide single crystal.SOLUTION: An apparatus 100 for growing an oxide single crystal comprises: a heat insulator 7 surrounding a heating space SP; a crucible 1 arranged in the heating space SP; a resistance heating type heater 4 arranged in the heating space SP; and an intermediate annular plate member 7C arranged in the heating space SP. The heating space SP is thermally separated into an upper heating space SP1 and a lower heating space SP2 by the crucible 1 and the intermediate annular plate member 7C, and the resistance heating type heater 4 includes an upper stage heater 4U arranged in the upper heating space SP1, and a middle heater 4M and lower stage heater 4L arranged in the lower heating space SP2 .SELECTED DRAWING: Figure 1 【課題】低コストで酸化物単結晶の大口径化及び長尺化に対応できる酸化物単結晶の育成装置を提供すること。【解決手段】酸化物単結晶の育成装置100は、加熱空間SPを囲む断熱材7と、加熱空間SP内に配置されるルツボ1と、加熱空間SP内に配置される抵抗加熱方式のヒータ4と、加熱空間SP内に配置される中間環状板部材7Cとを有する。加熱空間SPは、ルツボ1と中間環状板部材7Cによって上部加熱空間SP1と下部加熱空間SP2に熱的に分離される。抵抗加熱方式のヒータ4は、上部加熱空間SP1に配置される上段ヒータ4Uと、下部加熱空間SP2に配置される中段ヒータ4M及び下段ヒータ4Lとを含む。【選択図】図1