PROCESSING UNIT

PROBLEM TO BE SOLVED: To provide a processing unit which restrains deformation on a work-piece by temperature difference.SOLUTION: A processing unit 200 for performing deposition or etching on a part of the work-piece 10 includes: a vacuum vessel 100 having a first mold 110 with a first concave port...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MOGI KAZUNARI, ASHITAKA YU
Format: Patent
Sprache:eng ; jpn
Schlagworte:
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