PHOTOSENSITIVE PASTE AND METHOD FOR PRODUCING PATTERN USING THE SAME

PROBLEM TO BE SOLVED: To provide a photosensitive paste that can form a fine pattern even when it is thick.SOLUTION: A photosensitive paste contains inorganic powder (A), an alkali-soluble resin (B), a compound having an unsaturated double bond (C), a photosensitizer (D), a solvent (E) and a terpene...

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Hauptverfasser:	YAMAGUCHI MICHIKO, SUWA MITSUFUMI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ARTIFICIAL STONE CEMENTS CERAMICS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE ELECTROGRAPHY HOLOGRAPHY LIME, MAGNESIA MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL REFRACTORIES SLAG SPRAYING OR ATOMISING IN GENERAL TRANSPORTING TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive paste that can form a fine pattern even when it is thick.SOLUTION: A photosensitive paste contains inorganic powder (A), an alkali-soluble resin (B), a compound having an unsaturated double bond (C), a photosensitizer (D), a solvent (E) and a terpene resin (F).SELECTED DRAWING: None 【課題】厚膜においても微細パターンを形成可能な感光性ペーストを提供すること。【解決手段】無機粉末（Ａ）、アルカリ可溶性樹脂（Ｂ）、不飽和二重結合を有する化合物（Ｃ）、感光剤（Ｄ）、溶剤（Ｅ）およびテルペン樹脂（Ｆ）を含有する感光性ペースト。【選択図】なし