RETICLE DEFECT INSPECTION WITH SYSTEMATIC DEFECT FILTER

PROBLEM TO BE SOLVED: To provide a method and apparatus for inspecting a photolithographic reticle.SOLUTION: A stream of defect data is received from a reticle inspection system. The defect data identifies a plurality of defects that have been detected for a plurality of different portions of a reti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LI BING, JOSEPH BLECHER, MA WEIMIN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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