REFLOW DEVICE AND MANUFACTURING METHOD OF BOARD USING THE SAME

PROBLEM TO BE SOLVED: To provide a simple reflow device by making solder on a board uniform, and to provide a manufacturing method of the board using the same.SOLUTION: A reflow device 1 performs reflow soldering of a board 90 having a first component 91 and a second component 92 having a heat capac...

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Hauptverfasser: KAMIYA HIROTERU, YAMAMOTO MASAYASU, FURUMOTO ATSUSHI, IKEDA HISAHIRO, JINNO MASATO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a simple reflow device by making solder on a board uniform, and to provide a manufacturing method of the board using the same.SOLUTION: A reflow device 1 performs reflow soldering of a board 90 having a first component 91 and a second component 92 having a heat capacity larger than that of the first component 91. The reflow device 1 includes first through sixth heating sections 11-16, a booth 40 and a control section 80. The control section 80 performs a process for raising the low heat capacity temperature T1 and the high heat capacity temperature T2, and then lowering the low heat capacity temperature T1 and raising the high heat capacity temperature T2, more than one time. Consequently, the low heat capacity temperature T1 is maintained constant equal to or above the melting point Tp of solder, and the high heat capacity temperature T2 can rise to the melting point Tp of solder. Difference between the low heat capacity temperature T1 and the high heat capacity temperature T2 is decreased easily, and the temperature on the board 90 is made uniform. Furthermore, configuration of the reflow device 1 is simplified, because control of the reflow device 1 simply set.SELECTED DRAWING: Figure 1 【課題】基板上のはんだを均一化し、簡易なリフロー装置およびそれを用いた基板の製造方法を提供する。【解決手段】リフロー装置1は、第1部品91および第1部品91の熱容量よりも熱容量が大きい第2部品92を有する基板90をリフローはんだ付けする。リフロー装置1は、第1−第6加熱部11−16、ブース40および制御部80を備える。制御部80は、低熱容量温度T1および高熱容量温度T2を昇温し、その後、低熱容量温度T1が低下するように、かつ、高熱容量温度T2が上昇する過程を、少なくとも2回以上行う。これにより、低熱容量温度T1がはんだの融点Tp以上に一定に維持され、高熱容量温度T2がはんだの融点Tpに上昇できる。低熱容量温度T1と高熱容量温度T2との差が小さくなりやすく、基板90上の温度が均一化される。また、リフロー装置1の制御を設定するのみであり、リフロー装置1が簡易な構成になる。【選択図】図1