METHOD FOR MANUFACTURING ARTICLE

PROBLEM TO BE SOLVED: To provide a technique which adjusts a surface of a processing object to an intermediate quality between a smooth surface and a rough surface while suppressing strength deterioration of the processing object.SOLUTION: Provide is a method for manufacturing an article having a fr...

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Hauptverfasser: ASAI MAIKO, IKEDO TOMOYA, TAMAI KAZUMASA
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a technique which adjusts a surface of a processing object to an intermediate quality between a smooth surface and a rough surface while suppressing strength deterioration of the processing object.SOLUTION: Provide is a method for manufacturing an article having a frost-like surface of which a surface roughness Rz is 1 μm or more. The method includes a roughening process in which a surface roughness of a processing object surface Rz is increased by polishing the processing object surface by use of a polishing liquid S1, which contains abrasive grains A1 which have an average particle diameter of not less than 5 μm and not more than 30 μm and a polishing pad P1, and a finish polishing process in which the surface roughness Rz of the processing object surface is decreased by polishing the processing object surface by use of a polishing liquid S2 containing abrasive grains A2 and a polishing pad P2, in this order. Herein, as the afore-said polishing pad P2, a polishing pad, which has a hardness higher than that of the polishing pad P1, is used.SELECTED DRAWING: None 【課題】加工対象物の強度低下を抑制しつつ、該加工対象物の表面を平滑面と粗面との中間的な質感に調整する技術を提供する。【解決手段】表面粗さRzが1μm以上のフロスト様表面を有する物品の製造方法が提供される。その方法は、平均粒子径5μm以上30μm以下の砥粒A1を含む研磨液S1と研磨パッドP1とを用いて加工対象面を研磨することにより該加工対象面の表面粗さRzを上昇させる粗化工程と、砥粒A2を含む研磨液S2と研磨パッドP2を用いて上記加工対象面を研磨することにより該加工対象面の表面粗さRzを低下させる仕上げ研磨工程と、をこの順に含む。ここで、上記研磨パッドP2としては、上記研磨パッドP1よりも高硬度の研磨パッドを使用する。【選択図】なし