TREATMENT APPARATUS AND COVER MEMBER

PROBLEM TO BE SOLVED: To suppress particles from being produced at an outer edge part of a stage arranged in a chamber.SOLUTION: The present invention relates to a treatment apparatus having a stage arranged in a chamber, and a cover member provided at an outer edge part of the stage and partitionin...

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Bibliographische Detailangaben
Hauptverfasser:	FUJISATO TOSHIAKI, KAMIO TAKUJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To suppress particles from being produced at an outer edge part of a stage arranged in a chamber.SOLUTION: The present invention relates to a treatment apparatus having a stage arranged in a chamber, and a cover member provided at an outer edge part of the stage and partitioning the inside of the chamber into an upper treatment space of the stage and a lower bottom space of the stage, the cover member having a first projection part coming into surface contact with a surface of the stage, a second projection part coming into surface contact with the surface of the stage apart from the first projection part, and an exhaust path for exhausting a gas from a buffer space formed of the cover member and the stage between the first projection part and second projection part.SELECTED DRAWING: Figure 5 【課題】チャンバ内に配置されたステージの外縁部におけるパーティクルの発生を抑制することを目的とする。【解決手段】チャンバ内に配置されたステージと、前記ステージの外縁部に設けられ、前記チャンバ内を前記ステージの上部の処理空間と前記ステージの下部のボトム空間とに区画するカバー部材と、を有する処理装置であって、前記カバー部材は、前記ステージの表面と面接触する第１の突出部と、前記第１の突出部と離隔して前記ステージの表面と面接触する第２の突出部と、前記第１の突出部と前記第２の突出部との間にて前記カバー部材と前記ステージとにより形成されたバッファ空間からガスを排気する排気路と、を有する処理装置が提供される。【選択図】図５