PROBER AND PROBE INSPECTION METHOD
PROBLEM TO BE SOLVED: To provide a prober capable of stably performing a contact operation and a release operation by a vacuum suction system, and a probe inspection method.SOLUTION: A prober comprises: a wafer chuck 34 holding a wafer W; a probe card 32 including a plurality of probes 36 on a surfa...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a prober capable of stably performing a contact operation and a release operation by a vacuum suction system, and a probe inspection method.SOLUTION: A prober comprises: a wafer chuck 34 holding a wafer W; a probe card 32 including a plurality of probes 36 on a surface facing the wafer chuck 34; a head stage 30 holding the probe card 32; an annular seal member 48 forming an internal space between the wafer chuck 34 and the probe card 32; a Z-axis moving and rotating part 72 which freely detachably fixes the wafer chuck 34 and elevates the wafer chuck 34; a decompression device 44 which sucks and holds the wafer chuck 34 on the probe card 32 side by applying a negative pressure to an internal space; and shutter means 58 which is provided in the head stage 30 and can selectively switch the internal space between a communication state in which the internal space is communicating with an external space and a non-communication state in which the internal space is not communicating with the external space.SELECTED DRAWING: Figure 4
【課題】真空吸着方式によるコンタクト動作やリリース動作を安定して行うことができるプローバ及びプローブ検査方法を提供する。【解決手段】ウエハWを保持するウエハチャック34と、ウエハチャック34に対向する面に複数のプローブ36を有するプローブカード32と、プローブカード32を保持するヘッドステージ30と、ウエハチャック34とプローブカード32との間に内部空間を形成する環状のシール部材48と、ウエハチャック34を着脱自在に固定してウエハチャック34を昇降させるZ軸移動・回転部72と、内部空間に負圧を付与することによりウエハチャック34をプローブカード32側に吸着保持する減圧装置44と、ヘッドステージ30に設けられ、内部空間が外部空間と連通した連通状態と内部空間が外部空間と連通しない非連通状態との間で選択的に切替可能なシャッタ手段58と、を備える。【選択図】図4 |
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