FILM DEPOSITION APPARATUS

PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of enhancing the uniformity of film thickness on the surface of a substrate.SOLUTION: The film deposition apparatus comprises: two tray units for holding a substrate having a rectangular and tabular shape in a rectangular frame; a plurality of catalyst lines positioned at a gap between the two substrates; a gas supply part for supplying film deposition gas to the gap; and a decompression part for depressurizing the gap to form the film deposition gas into an intermediate flow. At least one side out of four sides of the rectangular frame is a target side, and a distance between a second supply port group facing an end side portion of the target side and the target side is larger than a distance between a first supply port group facing an intermediate side portion and the target side in a direction orthogonal to the extending direction of the target side.SELECTED DRAWING: Figure 3 【課題】基板の面内における膜厚の均一性を高めることを可能とする成膜装置を提供する。【解決手段】矩形板状を有した基板を矩形枠内に各々保持する２つのトレイ装置と、２つの基板における間隙に位置する複数の触媒線と、間隙に成膜ガスを供給するガス供給部と、間隙を減圧して成膜ガスを中間流とする減圧部とを備え、矩形枠が有する四辺のなかの少なくとも一辺が対象辺であり、対象辺の延在方向と直交する方向において、対象辺の端辺部と対向する第２供給口群と対象辺との間の距離が、対象辺の中間辺部と対向する第１供給口群と対象辺との間の距離よりも大きい。【選択図】図３