WATERLESS LITHOGRAPHIC FOR SEAMLESS CAN AND METHOD FOR PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide a waterless lithographic for a seamless can used for printing for a seamless can requiring mass printing at a high speed, in which the generation of scum is suppressed, capable of forming a sharp image by small dots and further excellent in transportability, and a me...

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Bibliographische Detailangaben
Hauptverfasser:	SHINOHARA SHOICHI, KANAYAMA ZEN, MORIKAWA HISAAKI, AKIMOTO SOICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a waterless lithographic for a seamless can used for printing for a seamless can requiring mass printing at a high speed, in which the generation of scum is suppressed, capable of forming a sharp image by small dots and further excellent in transportability, and a method for producing the same.SOLUTION: Provided is a waterless lithographic for applying printing to the outer face of a seamless can, at least comprising: a substrate; and a laser heat-sensitive layer. A non-streak part made of a silicone rubber layer and a streak part freed from the silicone rubber are formed on the heat-sensitive layer, and the thickness of the silicone rubber layer in the non-streak part lies in the range of 2.2 to 5.5 μm.SELECTED DRAWING: Figure 2 【課題】高速での大量印刷が必要なシームレス缶用の印刷に用いられる水なし平版であって、地汚れの発生が抑制され、小さな網点による鮮明な画像の形成が可能であると共に、耐刷性にも優れたシームレス缶用水なし平版及びその製造方法を提供することである。【解決手段】シームレス缶の外面に印刷を施すための水なし平版であって、少なくとも基板、レーザ感熱層を有し、該感熱層上にシリコーンゴム層から成る非画線部及び該シリコーンゴムが除去された画線部が形成されており、前記非画線部のシリコーンゴム層の厚みが２．２〜５．５μｍの範囲にあることを特徴とする。【選択図】図２