PROBER
PROBLEM TO BE SOLVED: To provide a prober which allows for high accuracy wafer level inspection of high-frequency measurement or dynamic characteristics, while improving the work efficiency and reducing the cost.SOLUTION: A prober includes a wafer chuck 16, a movement and rotation mechanism of the w...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a prober which allows for high accuracy wafer level inspection of high-frequency measurement or dynamic characteristics, while improving the work efficiency and reducing the cost.SOLUTION: A prober includes a wafer chuck 16, a movement and rotation mechanism of the wafer chuck 16, a probe card 24 having a probe 25, a probe position detection camera 18, a wafer alignment camera 19, a camera lifting mechanism 40, a control section 60 for controlling the camera lifting mechanism 40 so that the height at the tip of the probe 25 is the same as the focal position of the wafer alignment camera 19, a stage member 50 having a conductive stage surface 50a connected electrically with the support surface 16a of the wafer chuck 16, and moving integrally with the wafer chuck W, and a conductive contact 70 configured to move integrally with the wafer alignment camera 19, and connecting the chip back electrode electrically with the tester body 31 by coming into contact with the stage surface 50a.SELECTED DRAWING: Figure 1
【課題】作業効率の向上及びコストの削減を図ることができ、高周波測定や動的特性のウエハレベル検査を高精度に行うことができるプローバを提供する。【解決手段】ウエハチャック16と、ウエハチャック16の移動回転機構と、プローブ25を有するプローブカード24と、プローブ位置検出カメラ18と、ウエハアライメントカメラ19と、カメラ昇降機構40と、プローブ25の先端の高さとウエハアライメントカメラ19の焦点位置とが同じ高さとなるようにカメラ昇降機構40を制御する制御部60と、ウエハチャック16の支持面16aに電気的に接続された導電性のステージ面50aを有し、ウエハチャックWと一体的に移動するステージ部材50と、ウエハアライメントカメラ19と一体的に移動可能に構成され、ステージ面50aに接触してチップ裏面電極をテスタ本体31に電気的に接続する導電性接触子70と、を備える。【選択図】図1 |
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