METHOD FOR MANUFACTURING ELECTRODE FOIL FOR ELECTROLYTIC CAPACITOR

PROBLEM TO BE SOLVED: To provide a method for manufacturing electrode foil for an electrolytic capacitor, which eliminates the need for removal of a remaining film by a dry process involving an evacuation process, which is high in UV light exposure or UV light ozone exposure effect, and which enable...

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Bibliographische Detailangaben
Hauptverfasser: KUBO SHOICHI, TSUKIDATE YOSHITAKA, NAKAGAWA MASARU, ISHIKAWA YASUYUKI, NAKABO TORU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing electrode foil for an electrolytic capacitor, which eliminates the need for removal of a remaining film by a dry process involving an evacuation process, which is high in UV light exposure or UV light ozone exposure effect, and which enables an uninterrupted processing.SOLUTION: A method for manufacturing electrode foil for an electrolytic capacitor comprises the steps of: forming a UV-sensitive compound layer on a surface of electrode foil; forming, on a surface of the UV-sensitive compound layer, a polymer layer including at least any of polymethacrylic acid ester and polyacrylic acid ester; forming a graft layer from the polymer layer by exposure to UV light; forming a thermoplastic polymer layer on a surface of the graft layer; forming concave and convex portions on the thermoplastic polymer layer by a thermal nanoimprint method; oxidizing the thermoplastic polymer layer, the graft layer and the UV-sensitive compound layer which remain in each concave portion by exposure to UV light or UV light ozone to cause depolymerization thereof; wet-etching the electrode foil at a position corresponding to the concave portion; and removing the UV-sensitive compound layer, the graft layer and the thermoplastic polymer layer on the electrode foil.SELECTED DRAWING: Figure 1 【課題】真空引きプロセスを伴うドライ処理による残膜除去が不要で、紫外線照射または紫外線オゾン照射効果が高く、連続処理可能な電解コンデンサ用電極箔の製造方法を提供する。【解決手段】電極箔の表面に感紫外線化合物層を形成し、感紫外線化合物層の表面に、少なくともポリメタクリル酸エステルまたはポリアクリル酸エステルのいずれかを含む重合体の層を形成し、紫外線を照射して前記重合体の層からグラフト層を形成し、グラフト層の表面に熱可塑性高分子層を形成し、熱ナノインプリント法により熱可塑性高分子層に凹凸を形成し、凹部に残存する熱可塑性高分子層とグラフト層と感紫外線化合物層とを紫外線照射により酸化、または、紫外線オゾン照射により酸化および解重合し、凹部に対応する位置の電極箔をウェットエッチングし、電極箔上の感紫外線化合物層とグラフト層と熱可塑性高分子層とを除去する。【選択図】図1